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    POLY DIELECTRIC CAPACITOR Search Results

    POLY DIELECTRIC CAPACITOR Result Highlights (5)

    Part ECAD Model Manufacturer Description Download Buy
    NFM15PC755R0G3D Murata Manufacturing Co Ltd Feed Through Capacitor, Visit Murata Manufacturing Co Ltd
    NFM15PC435R0G3D Murata Manufacturing Co Ltd Feed Through Capacitor, Visit Murata Manufacturing Co Ltd
    NFM15PC915R0G3D Murata Manufacturing Co Ltd Feed Through Capacitor, Visit Murata Manufacturing Co Ltd
    DE6B3KJ151KA4BE01J Murata Manufacturing Co Ltd Safety Standard Certified Lead Type Disc Ceramic Capacitors for Automotive Visit Murata Manufacturing Co Ltd
    DE6B3KJ471KB4BE01J Murata Manufacturing Co Ltd Safety Standard Certified Lead Type Disc Ceramic Capacitors for Automotive Visit Murata Manufacturing Co Ltd

    POLY DIELECTRIC CAPACITOR Datasheets Context Search

    Catalog Datasheet MFG & Type PDF Document Tags

    LCOS

    Abstract: 1P3M 0.35um 1P3M logic 3.3V 0.35um 2p4m cmos 0.35Um 2P4M 400-700nm 1P2M poly dielectric capacitor WFS-FS-20882-10
    Text: LCOS Backplane Process ▲ Features • 0.65µm/0.5µm/0.35µm FEOL - Supply Voltage: 3.3V/5.0V - Option: High voltage 13V/25V Diffusion Resistor Bulk-Poly capacitor • 0.35µm BEOL - CMP planarization for dielectric layers - Perfect planarization between Pixels


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    PDF 3V/25V) 400-700nm 5V/35V 5V/20V/30V Now/2001 WFS-FS-20882-10/2001 LCOS 1P3M 0.35um 1P3M logic 3.3V 0.35um 2p4m cmos 0.35Um 2P4M 1P2M poly dielectric capacitor WFS-FS-20882-10

    x2 capacitor

    Abstract: capacitor 0.15 j 100 MKT capacitor 0.33uf x2 gb T14472 capacitor 0.22 k 100 MKT capacitor 0.47 j 100 MKT X2-MKP IEC 60384-14 mkt T14472 capacitor 0.22 uF MKP X2
    Text: Metallized Poly Film X2 Capacitor CLASS I TOPMAY X2 MKP metallized polypropylene film capacitor, class X2 – TMF003 X2-MKP are non-inductively wound with metallized polypropylene film as the dielectric/electrode with copper-clad steel leads and encapsulated in a plastic case sealed with epoxy resin.


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    PDF TMF003 GB/T14472 280VAC x2 capacitor capacitor 0.15 j 100 MKT capacitor 0.33uf x2 gb T14472 capacitor 0.22 k 100 MKT capacitor 0.47 j 100 MKT X2-MKP IEC 60384-14 mkt T14472 capacitor 0.22 uF MKP X2

    0.18 um CMOS parameters

    Abstract: poly silicon resistor pepi c 0.18 um CMOS technology World transistors
    Text: 1.0 µm CMOS Process XC10 1.0 µm Mixed Signal CMOS Technology Schematic cross section NMOS Poly-Poly-CAP Broad variety of combinable process elements available: PMOS - Double poly capacitor Source Drain Source Drain Gate n+ - High ohmic and low TC resistors


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    PDF 10-3/K] 0.18 um CMOS parameters poly silicon resistor pepi c 0.18 um CMOS technology World transistors

    Capacitor Dielectric Comparison

    Abstract: MLCC capacitor 100nf 100v polyester surge MLCC 50V 100uf MLCC 10nF 100nF ESL X7R NPO esr dielectric absorption Styrene capacitor 10100G
    Text: Technical Note 3 Capacitor Dielectric Comparison MLCC Characteristic Capacitance DF I.R. Voltage VDC Temperature Range T.C (∆C) Dielectric Absorption Max Frequency (MHz) Frequency response Features/ Application Remarks Ceramic Disc Aluminum Electrolytics


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    PDF 1pF100nF 100pF100nF 100pF- 1-10G 10-100G 50v-600v 1nF-10uF 1uF-100uF Capacitor Dielectric Comparison MLCC capacitor 100nf 100v polyester surge MLCC 50V 100uf MLCC 10nF 100nF ESL X7R NPO esr dielectric absorption Styrene capacitor 10100G

    CMOS Process Family

    Abstract: 0.6 um cmos process BSIM3 resistor bsim3 bsim3 model metal oxide in capacitor xfab X-Fab
    Text: 0.8 µm CMOS Process Family CX08 State-of-the-art 5V 0.8µm CMOS Technology Main Process Flow with additional options: P substrate Analog elements: linear capacitor, high ohmic resistor High voltage module: different n- and p-type, MOSFETs up to 50V, N substrate on demand


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    transistor poly3

    Abstract: RR510 RR-504 RR-520 X28C256 rr520
    Text: Xicor Endurance Report Xicor Endurance Report RR-520 H. A.R. Wegener INTRODUCTION This report describes endurance relating to Xicor’sproducts employing the Direct WriteTM cell. These devices display enhanced endurance cycling characteristics that are attributable to the direct write cell, process


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    PDF RR-520 RR-504 000PageCycles transistor poly3 RR510 RR-504 RR-520 X28C256 rr520

    SCR SN 101

    Abstract: AY 5 3500 AY 6 smd SCR SN 102 SN 101 SCR
    Text: A H S e r ie s: P 9 0 P or ce lain C ap acitor s D e scr ip tion F u n ction al A p p lication s B e n e fi ts Porcelain Capacitors Positiv e TC “ P90” L ow ESR, High Q Capacitance Range 0.1 - 5100 pF High Self- resonance L ow Noise Established Reliability


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    ccd diode datasheet

    Abstract: and gate cmos Poly
    Text: Submicron Fab: 71 Vista Montana • San Jose, CA 95134 TEL: 408 222-8888 • FAX: (408) 222-2707 Wafer Foundry Services CMOS CCD Processes 1.2µm CMOS CCD Process ❖ ❖ ❖ ❖ ❖ ❖ ❖ ❖ Integration of CCD elements into a 1.2 N-well process 2 poly, 2 metal


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    PDF 5E14/cc ccd diode datasheet and gate cmos Poly

    2P4M

    Abstract: cmos transistor 0.35 um transistor 2p4m 0.35Um 2P4M of 2p4m
    Text: 0.35um 2P4M High Voltage 18V / 18V updated in 2005.03.24 Features ƒ Voltage Logic,High Voltage ƒ Starting material 3.3V,18V/18V P-type (100), Non-Epi ƒ Well Structure Logic : Retrograded Twin well (Nwell, Pwell) HV : Diffused Twin well (HNwell, HPwell)


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    PDF 8V/18V 100x100um2 2P4M cmos transistor 0.35 um transistor 2p4m 0.35Um 2P4M of 2p4m

    varactor flip chip

    Abstract: CMOS Stacked RF INtermétal
    Text: ▼ The Fujitsu Analog and RF CMOS Technology Description Building on Fujitsu’s expertise in leading-edge CMOS processes and analog design capabilities, the company’s RF CMOS technologies are optimized for wireless networks, cellular communication, WiMAX, digital multi-media


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    PDF 100GHz. WFS-FS-21329-11/2008 varactor flip chip CMOS Stacked RF INtermétal

    all transistor

    Abstract: 2P4M transistor 2p4m nmos transistor 0.35 um 73aa cmos transistor 0.35 um of 2p4m
    Text: 0.30um 2P4M High Voltage 13.5V /13.5V updated in 2005.04.05 Features ƒ Vdd Logic, High Voltage 3.3V, 13.5V/ 13.5V ƒ Substrate P-type (100), Non-Epi ƒ Well Logic : Retrograded Twin Well (Nwell, Pwell) HV : Diffused Twin Well (Hnwell, Hpwell) ƒ Isolation


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    Mn2O3

    Abstract: 20D3 graphite foil APEC ips presentation
    Text: 1 of 9 Improvements with Polymer Cathodes in Aluminum and Tantalum Capacitors John D. Prymak KEMET Electronics Corporation P. O. Box 5928 Greenville, SC 29606 Abstract – Reducing ESR in the tantalum capacitor has been the key driver in the application of polymer as a replacement for the


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    CMOS Process Family

    Abstract: 0.6 um cmos process 500-nm CMOS standard cell library CX06
    Text: 0.6 µm CMOS Process Family CX06 State-of-the-art 5V 0.6µm CMOS Technology Single-layer poly with double and triple layer metal option Double-layer poly with double and triple layer metal option Digital standard cell library Analog elements Memory generators RAM, DPRAM, ROM compiler


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    NMOS transistor 0.18 um CMOS

    Abstract: 1P3M LOCOS
    Text: 0.6um 1P3M High Voltage 16V / 16V updated in 2005.03.29 Features ƒ Voltage Logic,High Voltage 5V/5V,16V/16V ƒ Starting material P-type (100), 9~12 Ω-cm ƒ Well Structure CMOS Triple-well (Nwell,HNWell, Pwell) ƒ Isolation Conventional LOCOS, Bird's Beak = 0.18 um/side


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    PDF 6V/16V NMOS transistor 0.18 um CMOS 1P3M LOCOS

    bsim3v3

    Abstract: C035ANV IMD2 transistor pmos Vt poly dielectric capacitor
    Text: ANV Process ID: SM/SN [C035ANV] Applications Main Process Flow Situations where single-cell operation or • P Substrate extended battery life are key, e.g: • High Voltage Wells optional


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    PDF C035ANV] bsim3v3 C035ANV IMD2 transistor pmos Vt poly dielectric capacitor

    AL 2001

    Abstract: AL-2001 graphite foil capacitor electrolyte datasheet F2118 mno2 Al2001 T557
    Text: Performance Improvements with Polymer Ta and Al 2001 APEC by John Prymak Applications Manager P.O. Box 5928 Greenville, SC 29606 Phone (864) 963-6300 Fax (864) 963-66521 www.kemet.com F2118 12/04 1 of 9 Improvements with Polymer Cathodes in Aluminum and Tantalum Capacitors


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    PDF F2118 AL 2001 AL-2001 graphite foil capacitor electrolyte datasheet mno2 Al2001 T557

    Untitled

    Abstract: No abstract text available
    Text: Syfer - Multilayer Ceramic Capacitors and EMI Filters Monday 19th January 2009 Go Input Part Number ABOUT SYFER High Voltage SM Capacitors AGENTS & DISTRIBUTORS NEWS SPOTLIGHT CONTACT US Choose your Language: English Please login Home Multilayer Ceramic Capacitors


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    PDF AN0001 AN0004 AN0005 19-Jan-2009 \SCHNEIDER\01192009 1\SYFT\1206J0630220JCT AN0006 AN0008 598KB) AN0012

    Untitled

    Abstract: No abstract text available
    Text: Syfer - Multilayer Ceramic Capacitors and EMI Filters Monday 19th January 2009 Go Input Part Number ABOUT SYFER High Voltage SM Capacitors AGENTS & DISTRIBUTORS NEWS SPOTLIGHT CONTACT US Choose your Language: English Please login Home Multilayer Ceramic Capacitors


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    PDF AN0001 AN0004 AN0005 19-Jan-2009 \SCHNEIDER\01192009 1\SYFT\0805J0630220JCT AN0006 AN0008 598KB) AN0012

    Untitled

    Abstract: No abstract text available
    Text: Syfer - Multilayer Ceramic Capacitors and EMI Filters Monday 19th January 2009 Go Input Part Number ABOUT SYFER High Voltage SM Capacitors AGENTS & DISTRIBUTORS NEWS SPOTLIGHT CONTACT US Choose your Language: English Please login Home Multilayer Ceramic Capacitors


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    PDF AN0001 AN0004 AN0005 19-Jan-2009 \SCHNEIDER\01192009 1\SYFT\0805J0630680JCT AN0006 AN0008 598KB) AN0012

    Untitled

    Abstract: No abstract text available
    Text: Syfer - Multilayer Ceramic Capacitors and EMI Filters Monday 19th January 2009 Go Input Part Number ABOUT SYFER High Voltage SM Capacitors AGENTS & DISTRIBUTORS NEWS SPOTLIGHT CONTACT US Choose your Language: English Please login Home Multilayer Ceramic Capacitors


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    PDF AN0001 AN0004 AN0005 19-Jan-2009 \SCHNEIDER\01192009 1\SYFT\0805J0630560JCT AN0006 AN0008 598KB) AN0012

    arcotronics capacitors mkp

    Abstract: No abstract text available
    Text: CAPACITORS FOR CLAMPING APPLICATIONS METALLIZED POLYPROPYLENE MKP C 4DR Series The Capacitors od C4D Series are designed with reinforced metallized poly­ propylene dielectric film. These Capacitors are suitable to withstand the hea­ vy current pulses usually met in clamping circuits showing very low values


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    PDF C4DRSUQ4100 C4DRSUQ4200 C4DRSUQ4300 C4DRSUQ4400 C4DRSUQ4500 C4DRSUQ4750 C4DRSUQ5150 arcotronics capacitors mkp

    SC-15

    Abstract: EEPROM flotox Japanese Transistor Cross References
    Text: u these components. In this paper, we will focus on the technology factors by comparing the three dom ­ inant E2 technologies to date, and giving our own viewpoint on the development in the market place. COMPARISON AND TRENDS IN TO DAY’S DOM INANT E2 TECHNOLOGIES


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    transistor equivalent table

    Abstract: SD2300
    Text: NEW ULTRA-HIGH DEN SITY TEX TU R ED POLY-Si FLOATING G A TE E 2PROM C E L L By D. Guterman, B. Houck, L. Starnes and B. Yeh This paper describes a new, highly scaled cell structure, the smallest full function E2PROM cell re­ ported to date. It utilizes the textured triple-poly-si


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    PDF BD230G01S/04 X130/1 transistor equivalent table SD2300

    Sprague 40 capacitor

    Abstract: No abstract text available
    Text: QUICK GUIDE TO FILM CAPACITORS OSPRAGUE GUIDE TO METALIZED-FILM CAPACITORS PAPER/ POLYESTER Sprague milm Metal-Cased Tubular Type Cap. Range Temp. Range Volt. Range POLYCARBONATE Sprague Metfilm®K 218P .001-12>*F - 5 5 to + 125°C 100to400VDC POLYPROPYLENE


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    PDF 01-12uF 50to400VDC 033-20pF 01-10/iF 80to440VAC 001-10/iF 0047-10mF 50to600VDC 022-1O Sprague 40 capacitor