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    Abstract: No abstract text available
    Text: 08cj-B-04 ひず 歪みシリコンチャネル立体構造トランジスタ Three-dimensional stress engineering in FinFET for high performance Si-LSI ◆ 将来のLSIにおける有力デバイス候補である 立体構造トランジスタに対する歪み


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    Trends And Opportunities In Semiconductor Licensing

    Abstract: FinFET
    Text: Semiconductor Licensing Trends Trends And Opportunities In Semiconductor Licensing By Stefan Tamme, Stephen Schott, Dogan Gunes, Jeffrey Wallace, Richard Boadway, Frank Razavi, and Marc Pépin Summary The following article examines the impact of current business, technology, and international trends


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