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Catalog Datasheet	MFG & Type	Document Tags	PDF
GaP photodiode Abstract: 6F22 9V BATTERY sensor alcohol 172-nm 6F22 Text: VUV-Radiometer with Scintillation Sensor Head Rev 01/06 The EPIGAP VUV-Radiometer is designed to measure and monitor VUV excimer radiation sources at λ=172nm. The scintillation based sensor head converts radiation by luminescence with a CaF2-EU system. A	Original	172nm. 172nm D-12555 GaP photodiode 6F22 9V BATTERY sensor alcohol 172-nm 6F22	PDF
Weight sensor Abstract: uv sensor uv tube lamp curing spectra head windmill design Zener Diode colour HUV172 HUV185 HUV254 Text: PRELIMINARY UV POWER METER For absolute optical power measurement OVER VIEW FEATURES The Hamamatsu UV power meter is designed to measure absolute optical power in the UV to vacuum UV region, in real time mode mW/cm2 or integration mode (J/cm2). The sensor head	Original	SE-171-41 1009E01 Weight sensor uv sensor uv tube lamp curing spectra head windmill design Zener Diode colour HUV172 HUV185 HUV254	PDF
Treadmill Abstract: POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm Text: 157-nm Lithography for 100-nm Node Challenges and Progress G. Dao and Y. Borodovsky Acknowledgment The Japan Electronic Journal P. Gargini, P. Silverman, F. C. Lo, A. Grenville, L. Liao, E. Panning, Orvek, and J.F. Zheng R =	Original	157-nm 100-nm Treadmill POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm	PDF
UV LED 280 nm Abstract: GaP photodiode uv photodiode, GaP UV photodiodes UV-c LED uvb sensor UVC LED Text: FlatLog System Rev 03/08 EPIGAP's FlatLog System for advanced optical measurement applications is intended for measuring and storing UV irradiance and UV dose energy density data. Especially designed for maintenance and calibration purposes of UV curing facilities, this unique	Original	D-12555 UV LED 280 nm GaP photodiode uv photodiode, GaP UV photodiodes UV-c LED uvb sensor UVC LED	PDF
Untitled Abstract: No abstract text available Text: エキシマランプ光源接合洗浄改質実績改質 •各種材料の表面改質※ 100 されています。そのなかでエキシマラ 90 ンプを用いた改質は原子・分子レベル 80 の化学反応によるものであるため従	Original	B0019JA TLSZ1025J04	PDF