DSA00386508.pdf
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- 4/ (FOLSVH3OXV 'DWD 6KHHW WWWWWW &RPELQLQJ 3HUIRUPDQFH 'HQVLW\ DQG (PEHGGHG 5$0 'HYLFH +LJKOLJKWV )OH[LEOH 3URJUDPPDEOH /RJLF .25 µm five layer metal CMOS Process $GYDQFHG &ORFN 1HWZRUN
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