ionizer
Abstract: variable high voltage 65831 ioniser symposium dc corona discharge simulation
Text: Comparative Study of Reticle Electrical Static Discharge under N2 purge and 40% Relative Humidity Ambient J. F. Zheng1, J. A. Montoya2, M. Chandhook3 P. Sanchez4, Giang Dao1 and Fu-Chang Lo1 1Advanced Mask Technology 2Intel Facility Technology Development
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Treadmill
Abstract: POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm
Text: 157-nm Lithography for 100-nm Node Challenges and Progress G. Dao and Y. Borodovsky Acknowledgment The Japan Electronic Journal P. Gargini, P. Silverman, F. C. Lo, A. Grenville, L. Liao, E. Panning, Orvek, and J.F. Zheng R =
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157-nm
100-nm
Treadmill
POWER SUPPLY for Treadmill
ionizer
teflon af
asahi glass delay line
u-key
hydrocarbon polymeric
symposium
NIKON
13Nm
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AN 1213
Abstract: NIKON Asahi Glass
Text: 157 nm Mask Technology Development Status Update Giang Dao*a, Ronald Kuseb, Kevin Orvek a, Eric Panninga, Roswitha Remlingb, Jun Fei Zhenga, Munehiko Tsubosakic, and Fu-Chang Loa Intel Corporation, aComponents Research, bIntel Mask Operations, Santa Clara, CA 95052
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157-nm
100-nm
70-nm
157nm
180-nm
157-nm
AN 1213
NIKON
Asahi Glass
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windmill design
Abstract: Polyoxymethylene blind cover R6800U-26 phototube hamamatsu
Text: METAL PACKAGE SOLAR BLIND PHOTOTUBE PRELIMINARY DATA AUG. 1999 R6800U-26 Compact 16 mm diameter, 12 mm seated length , solar blind (spectral response: 115 to 220 nm) The R6800U-26 is a subminiature phototube encapsulated in a TO-8 metal package. The electrode structure
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R6800U-26
R6800U-26
126nm
157nm
SE-171-41
1010E02
windmill design
Polyoxymethylene
blind cover
phototube hamamatsu
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ipl xenon
Abstract: gore membrane vents power supply for magnetron 80-wafer-per-hour schematic diagram of ip camera ,ipl xenon spy camera circuit diagram spy camera schematic diagram intel atom carl zeiss
Text: MICROPROCESSOR REPORT www.MPRonline.com T H E I N S I D E R ’ S G U I D E T O M I C R O P R O C E S S O R H A R D WA R E EXTREME LITHOGRAPHY Intel Backs EUV for Next-Generation Lithography By Ke ith D ie fe ndor ff {6/19/00-01} Working at the very boundary between theoretical physics and practical engineering, scientists at Lawrence Livermore, Sandia, and Lawrence Berkeley National Laboratories
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EUA SOT23-8
Abstract: SO-113 MAX4255EUK
Text: 19-1295; Rev 1; 1/98 A lilX I V M SOT23, Si ng l e- Suppl y, L o w -Noise, L o w - D i s t o r t i o n , R ai l - t o- Rai l Op A m p s _ F e a t u r e s The MAX4249-MAX4257 low-noise, low-distortion oper ational amplifiers offer Rail-to-Rail outputs and single
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MAX4249-MAX4257
MAX4249/
MAX425jx
EUA SOT23-8
SO-113
MAX4255EUK
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